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Purification of gallium is necessary to prevent contamination of the final semiconductor product by out-gassing constituents of the growth chamber and anode materials. Particularly in the use of high purity gallium in electronic devices, purity of greater than 99.999% is needed.
Gallium is a chemically active metal with a low melting point and is easily reduced to a volatile gallium metal by current methods. Reduction to the metallic state is primarily an alloying reaction with carbon, but can also involve the reaction of carbon with hydrogen or aluminum.
The reduction of gallium to the metallic state is a reaction to be avoided because of the contamination of the material by carbon and oxygen. As gallium is reduced to the metallic state, volatile carbon, oxygen, and hydrogen are also evolved from the cell environment. The volatile contaminants are driven from the cell and are vented into the atmosphere at temperatures below the melting point of gallium. The volatiles, known as xe2x80x9coutgassingxe2x80x9d, evolve over a period of hours and may include carbon, hydrogen, and oxygen. It is, therefore, essential to maintain low oxygen, high vacuum conditions.
There are several means for achieving such low oxygen levels in a vacuum system, but such methods normally involve very high costs and, in some instances, elaborate equipment. In the present invention, a means for reducing the gaseous contaminants associated with the reduction of gallium to the metallic state is
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